Search Results1-15 of  15

  • Takechi Satoshi ID: 9000009564425

    Articles in CiNii:1

    • Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-layer Resist (1996)
  • TAKECHI SATOSHI ID: 9000252776909

    Fujitsu Ltd. (1996 from CiNii)

    Articles in CiNii:1

    • A Novel Polymer for a 193-nm Resist. (1996)
  • TAKECHI SATOSHI ID: 9000253032227

    Fujistu Limited 1015 Kamikodanaka (1995 from CiNii)

    Articles in CiNii:1

    • Study of ArF resist material in terms of transparency and dry etch resistance. (1995)
  • TAKECHI SATOSHI ID: 9000253032232

    1015 Kamikodanaka, Nakahara-ku (1995 from CiNii)

    Articles in CiNii:1

    • Si-Containing Positive Resist for ArF Excimer Laser Lithography. (1995)
  • TAKECHI Satoshi ID: 9000001655395

    Fujitsu limited (1997 from CiNii)

    Articles in CiNii:1

    • Development of Resist Materials for ArF Lithography (1997)
  • TAKECHI Satoshi ID: 9000004754854

    Electronic Devices Group, Fujitsu Limited (2001 from CiNii)

    Articles in CiNii:1

    • Current Status of ArF Lithography and Its Prospect (2001)
  • TAKECHI Satoshi ID: 9000005593313

    Yokohama Research Center, Association of Super-Advanced Electronics Technologies:(Present address) Process Development Division, Fujitsu Ltd. (1998 from CiNii)

    Articles in CiNii:1

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing and Admantyl Unit (1998)
  • TAKECHI Satoshi ID: 9000285966991

    Shuto General Hospital, JA Yamaguchi Prefectural Welfare Federation of Agricultural Cooperative (2015 from CiNii)

    Articles in CiNii:3

    • Prediction of discharge destination in stroke patients 2 weeks after stroke onset : Comparison of NIHSS, FMS, and FIM (2013)
    • Investigation of Factors Affecting the Ability for Gait Using a Cane and Walking Speed in Patients with Hip Fractures: Factors Determining the Ability for Gait Using a Cane are Different from those Determining Walking Speed (2014)
    • Factors Affecting the Perceived Leg Length Discrepancy after Total Hip Arthroplasty : Using a Hierarchical Multiple Regression Analysis (2015)
  • TAKECHI Satoshi ID: 9000292882168

    Dept. of Rehabilitation Medicine, Shuto General Hospital (2015 from CiNii)

    Articles in CiNii:1

    • Factor Affecting Stair-Climbing Ability of Patients With Hip Factures (2015)
  • TAKECHI Satoshi ID: 9000312253362

    Department of Rehabilitation Medicine, Shuto General Hospital, JA Yamaguchi Prefectural Welfare Federation of Agricultural Cooperative (2015 from CiNii)

    Articles in CiNii:1

    • Investigation of Factors Affecting the Ability for Gait Using a Cane and Walking Speed in Patients with Hip Fractures: Factors Determining the Ability for Gait Using a Cane are Different from those Determining Walking Speed (2015)
  • TAKECHI Satoshi ID: 9000345282736

    Dept. of Rehabilitation Medicine, Shuto General Hospital (2016 from CiNii)

    Articles in CiNii:1

    • A Study of Inter-rater Reliability of Lower Limb Muscle Strength Measurements Using a Hand-held Dynamometer in Patients with Hip Fracture:Does Reliability Differ between Patient Groups According to Severity of Cognitive Impairment? (2016)
  • Takechi Satoshi ID: 9000252776887

    Fujitsu Limited (1996 from CiNii)

    Articles in CiNii:1

    • Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist (1996)
  • Takechi Satoshi ID: 9000253031836

    Fujitsu Limited (1994 from CiNii)

    Articles in CiNii:1

    • Lithographic characteristics of alicyclic polymer based ArF single layer resists. (1994)
  • Takechi Satoshi ID: 9000258138637

    Yokohama Research Center, Association of Super–Advanced Electronics Technologies, 292 Yoshida–cho, Totsuka–ku, Yokohama 244–0817, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit. (1998)
  • Takechi Satoshi ID: 9000401674902

    Articles in CiNii:1

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit (1998)
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