Search Results1-20 of  59

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  • Terasawa Tsuneo ID: 9000025057710

    Articles in CiNii:1

    • Actinic mask blank inspection and signal analysis for detecting phase defects down to 1.5nm in height (Special issue: Microprocesses and nanotechnology) (2009)
  • Terasawa Tsuneo ID: 9000025083253

    Articles in CiNii:1

    • Actinic phase defect detection for extreme ultraviolet lithography mask with absorber patterns (Special issue: Microprocesses and nanotechnology) (2010)
  • Terasawa Tsuneo ID: 9000241752798

    Articles in CiNii:1

    • Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability (2013)
  • TERASAWA Tsuneo ID: 9000001107664

    MIRAI-ASET (2003 from CiNii)

    Articles in CiNii:1

    • CW 199-nm light source for advanced mask inspections (2003)
  • TERASAWA Tsuneo ID: 9000002958826

    MIRAI-ASET (2007 from CiNii)

    Articles in CiNii:8

    • Phase-shifting Lithography-Improving Resolution of Optical Lithography Using Phase-shifting Technology (1992)
    • Lithographic Technologies for fabrication of 0.15um and below (1998)
    • Optical Proximity Correction using an Optimization Method after Layout Design (2007)
  • TERASAWA Tsuneo ID: 9000004870826

    Central Research Laboratory, Hitachi Ltd. (1999 from CiNii)

    Articles in CiNii:10

    • Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below (1995)
    • Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI) (1993)
    • 0.13 μm Pattern Delineation Using KrF Excimer Laser Light (1994)
  • TERASAWA Tsuneo ID: 9000005593409

    Central Research Laboratory, Hitachi Ltd. (1998 from CiNii)

    Articles in CiNii:1

    • A Fast Method of Simulating Resist Pattern Contours Based on Mean Inhibitor Concentration (1998)
  • TERASAWA Tsuneo ID: 9000005624349

    Central Research Laboratory, Hitachi, Ltd. (1992 from CiNii)

    Articles in CiNii:1

    • Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography : (1992)
  • TERASAWA Tsuneo ID: 9000005716360

    Central Research Laboratory, Hitachi, Ltd. (1997 from CiNii)

    Articles in CiNii:1

    • Phase Retrieval from Defocused Images and Its Applications in Lithography (1997)
  • TERASAWA Tsuneo ID: 9000005716741

    Central Research Laboratory, Hitachi Ltd. (1997 from CiNii)

    Articles in CiNii:1

    • Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations (1997)
  • TERASAWA Tsuneo ID: 9000005844891

    Central Research Laboratory, Hitachi Ltd. (2000 from CiNii)

    Articles in CiNii:1

    • Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging (2000)
  • TERASAWA Tsuneo ID: 9000019052769

    (株)EUVL基盤開発センター (2012 from CiNii)

    Articles in CiNii:1

    • At Wavelength Inspection of 6-inch Extreme Ultraviolet Lithography Mask Blank (2012)
  • TERASAWA Tsuneo ID: 9000020768974

    Articles in CiNii:1

    • Alignment technique using heterodyne interferometer in conjugate relation for wafer stepper. (1991)
  • TERASAWA Tsuneo ID: 9000107334539

    Central Research Laboratory, Hitachi, Ltd. (2001 from CiNii)

    Articles in CiNii:1

    • Simulation of Multilayer Defects in Extreme Ultraviolet Masks (2001)
  • TERASAWA Tsuneo ID: 9000107336177

    MIRAI, Association of Super-Advanced Electronics Technologies (2006 from CiNii)

    Articles in CiNii:1

    • Critical-Dimension Measurement using Multi-Angle-Scanning Method in Atomic Force Microscope (2006)
  • TERASAWA Tsuneo ID: 9000107386605

    MIRAI-Association of Super-Advanced Electronics Technologies (ASET) (2006 from CiNii)

    Articles in CiNii:1

    • Side-Wall Measurement using Tilt-Scanning Method in Atomic Force Microscope (2006)
  • TERASAWA Tsuneo ID: 9000107386644

    MIRAI-Association of Super-Advanced Electronics Technologies (2006 from CiNii)

    Articles in CiNii:1

    • Sensitivity-Limiting Factors of at-Wavelength Extreme Ultraviolet Lithography Mask Blank Inspection (2006)
  • TERASAWA Tsuneo ID: 9000107386705

    MIRAI-Association of Super-Advanced Electronics Technologies (ASET) (2006 from CiNii)

    Articles in CiNii:1

    • Improved Image Resolution for Wafer Inspection Tool Using Sub-200-nm Wavelength Light Optical System (2006)
  • TERASAWA Tsuneo ID: 9000259340584

    EUVL Infrastructure Development Center, Inc. (2013 from CiNii)

    Articles in CiNii:1

    • Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope (2013)
  • Terasawa Tsuneo ID: 9000082850243

    Articles in CiNii:1

    • Height Measurement Using High-Precision Atomic Force Microscope Scanner Combined with Laser Interferometers (2006)
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