Search Results1-19 of  19

  • TSURUOKA Taiji ID: 9000004821481

    The authors are with R & D Department, Components Division, Oki Electric Industry Co., Ltd. (2000 from CiNii)

    Articles in CiNii:2

    • Arraayed 1 × N Switch for Wavelength Routing (2000)
    • Effect of SiF_4/SiH_4/H_2 Flow Rates on Film Properties of Low-Temperature Polycrystalline Silicon Films Prepared by Plasma Enhanced Chemical Vapor Deposition (1994)
  • TSURUOKA Taiji ID: 9000004892984

    Device Business Group, Oki Electric Ind. Co., Ltd. (2000 from CiNii)

    Articles in CiNii:6

    • LiNbO_3 Optical Switch Array for Optical Wavelength Division Multiplexing Systems (2000)
    • Waveguide Array Optical Switching Element (1999)
    • LiNbO_3 Optical Switch Array for Optical Wavelength Division Multiplexing Systems (2000)
  • TSURUOKA Taiji ID: 9000005609283

    R&D Group, Oki Electric Industry, Co., Ltd. (2000 from CiNii)

    Articles in CiNii:1

    • Reversed and Uniform Δβ Directional Coupler Optical Switch with Periodically Changing Coupling Strength (2000)
  • Tsuruoka Taiji ID: 9000252761466

    Research and Development Group, Oki Electric Industry Co., Ltd. (1989 from CiNii)

    Articles in CiNii:1

    • Y–Ba–Cu–O Film Growth by OMCVD Using N<SUB>2</SUB>O (1989)
  • Tsuruoka Taiji ID: 9000252962366

    Research and Development Division, Oki Electric Ind. Co., Ltd. (1987 from CiNii)

    Articles in CiNii:1

    • High <I>T</I><SUB>c</SUB> Superconductivity of Y–Ba–Cu–O Ceramics (1987)
  • Tsuruoka Taiji ID: 9000252967697

    Research and Development Group, Oki Electric Industrial Co., Ltd. (1988 from CiNii)

    Articles in CiNii:1

    • Y<SUB>1</SUB>Ba<SUB>2</SUB>Cu<SUB>3</SUB>O<SUB>7−δ</SUB> Film Formation by an OM-CVD Method (1988)
  • Tsuruoka Taiji ID: 9000252982702

    Research Laboratory, Oki Electric Industry Co., Ltd. (1992 from CiNii)

    Articles in CiNii:1

    • Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films (1992)
  • Tsuruoka Taiji ID: 9000258150900

    R&D Group, Oki Electric Industry, Co., Ltd., 550-5 Higashiasakawa, Hachioji, Tokyo 193, Japan (2000 from CiNii)

    Articles in CiNii:1

    • Reversed and Uniform .DELTA..BETA. Directional Coupler Optical Switch with Periodically Changing Coupling Strength. (2000)
  • Tsuruoka Taiji ID: 9000283158210

    Articles in CiNii:1

    • Phosphorus Doping Using Electron Cyclotron Resonance Plasma for Large-Area Polycrystalline Silicon Thin Film Transistors. (1994)
  • Tsuruoka Taiji ID: 9000392696486

    Articles in CiNii:1

    • Y<SUB>1</SUB>Ba<SUB>2</SUB>Cu<SUB>3</SUB>O<SUB>7−δ</SUB> Film Formation by an OM-CVD Method (1988)
  • Tsuruoka Taiji ID: 9000392702318

    Articles in CiNii:1

    • Y–Ba–Cu–O Film Growth by OMCVD Using N<SUB>2</SUB>O (1989)
  • Tsuruoka Taiji ID: 9000392708661

    Articles in CiNii:1

    • High <I>T</I><SUB>c</SUB> Superconductivity of Y–Ba–Cu–O Ceramics (1987)
  • Tsuruoka Taiji ID: 9000392729513

    Articles in CiNii:1

    • Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films (1992)
  • Tsuruoka Taiji ID: 9000401605771

    Articles in CiNii:1

    • HighTcSuperconductivity of Y-Ba-Cu-O Ceramics (1987)
  • Tsuruoka Taiji ID: 9000401608705

    Articles in CiNii:1

    • Y1Ba2Cu3O7-δFilm Formation by an OM-CVD Method (1988)
  • Tsuruoka Taiji ID: 9000401614391

    Articles in CiNii:1

    • Y-Ba-Cu-O Film Growth by OMCVD Using N2O (1989)
  • Tsuruoka Taiji ID: 9000401631305

    Articles in CiNii:1

    • Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films (1992)
  • Tsuruoka Taiji ID: 9000401644514

    Articles in CiNii:1

    • Phosphorus Doping Using Electron Cyclotron Resonance Plasma for Large-Area Polycrystalline Silicon Thin Film Transistors (1994)
  • Tsuruoka Taiji ID: 9000401687740

    Articles in CiNii:1

    • Reversed and UniformΔβ Directional Coupler Optical Switch with Periodically Changing Coupling Strength (2000)
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