Search Results1-20 of  233

  • Ueda Mitsuru ID: 9000009565327

    Articles in CiNii:1

    • A New Photoresist Based on Poly(propyleneimine) Dendrimer (2000)
  • Ueda Mitsuru ID: 9000009565782

    Articles in CiNii:1

    • Synthesis and Characterization of Calix[4]resorcinarene Bearing Azobenzene Moieties as Novel Photofunctional Amorphous Molecule (2001)
  • Ueda Mitsuru ID: 9000009565818

    Articles in CiNii:1

    • A New Positive Working Alkaline Developable Photoresist Based on a Simple Amorphous Molecule, Tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a Photoacid Generator (2001)
  • Ueda Mitsuru ID: 9000009566123

    Articles in CiNii:1

    • Recent Development in Photosensitive Polyimide(PSPI) (2001)
  • Ueda Mitsuru ID: 9000009661155

    Articles in CiNii:1

    • New Positive-type Chemically Amplified Photosensitive Poly(phenylene ether)(5)Synthesis of Poly(2-hydroxy-6-methylphenylene ether) by Oxidative Coupling Polymerization of 2-Trialkylsilyloxy-6-Methylphenol (2002)
  • Ueda Mitsuru ID: 9000009746760

    Articles in CiNii:1

    • DFT Calculations of Photoabsorption Spectra for Alicyclic and Heterocyclic Compounds in the VUV Region (2003)
  • Ueda Mitsuru ID: 9000010317877

    Articles in CiNii:1

    • A negative type photosensitive polymer based on poly(naphthylene ether), a cross-linker and photoacid generator with low dielectric constant (2007)
  • Ueda Mitsuru ID: 9000010400346

    Articles in CiNii:1

    • Development of negative-type photosensitive semi-alicyclic polyimide using a photobase generator (2007)
  • Ueda Mitsuru ID: 9000010553145

    Articles in CiNii:1

    • Development of negative-type photosensitive polyimide, based on poly(amic acid)s, photo base generator and thermal base generator (2008)
  • Ueda Mitsuru ID: 9000010553162

    Articles in CiNii:1

    • Negative-type chemically amplified photosensitive novolac (2008)
  • Ueda Mitsuru ID: 9000010587461

    Articles in CiNii:1

    • Synthesis of diazirine possessing an acetophenone derivative as a valuable intermediate for a flavonoid photoaffinity probe (2008)
  • Ueda Mitsuru ID: 9000015306844

    Articles in CiNii:1

    • Chemically amplified photosensitive polyimides and polybenzoxazoles (2009)
  • Ueda Mitsuru ID: 9000018880396

    Articles in CiNii:1

    • Synthesis of Calixresorcinarene Derivatives with Cross-linking units and Evaluation of Lithographic Performance (2011)
  • Ueda Mitsuru ID: 9000019000611

    Articles in CiNii:1

    • Development of Thermally Stable and Photosensitive Polymers (2012)
  • Ueda Mitsuru ID: 9000379564028

    Articles in CiNii:1

    • Recent progress in thermally stable and photosensitive polymers (Special issue for the 50th anniversary of Polymer Journal) (2018)
  • Ueda Mitsuru ID: 9000387478197

    Articles in CiNii:1

    • Synthesis and characterization of poly(2,6-dialkoxy-1,5-naphthylene)s with low dielectric constants (2018)
  • Mitsuru Ueda ID: 9000257899165

    Tokyo Institute of Technology (2012 from CiNii)

    Articles in CiNii:1

    • The Photopolymer Science and Technology Award (2012)
  • UEDA MITSURU ID: 9000253030900

    Department of Polymer Chemistry, Faculty of Engineering, Yamagata University (1990 from CiNii)

    Articles in CiNii:1

    • Positive deep UV resist based on poly(.ALPHA.-acetoxystyrene). (1990)
  • UEDA MITSURU ID: 9000253030947

    permanent address/Department of Polymer Chemistry, Yamagata University (1990 from CiNii)

    Articles in CiNii:1

    • Chemical amplification based on acid-catalyzed depolymerization. (1990)
  • UEDA MITSURU ID: 9000256193515

    Department of Polymer Chemistry, Yamagata University (1975 from CiNii)

    Articles in CiNii:1

    • An Approach to Systematization of Polyamide Formation (1975)
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