Search Results1-9 of  9

  • USHIKU Yukihiro ID: 9000001719199

    Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation (2000 from CiNii)

    Articles in CiNii:1

    • Theoretical Study on the Formation Process of Empty Space in Silicon (ESS) (2000)
  • USHIKU Yukihiro ID: 9000005588121

    Advanced Semiconductor Devices Research Laboratories, Toshiba Corporation (1998 from CiNii)

    Articles in CiNii:4

    • Evaluation of 0.3μm Poly-Silicon CMOS Circuits for Intelligent Power IC Application (1997)
    • Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure (1996)
    • Evaluation of 0.3 μm Poly-Silicon CMOS Circuits for Intelligent Power IC Application (1998)
  • USHIKU Yukihiro ID: 9000107355710

    Microelectronics Engineering Laboratory, Toshiba Corporation (1997 from CiNii)

    Articles in CiNii:1

    • Agglomeration Resistant Self-Aligned Silicide Process Using N_2 Implantation into TiSi_2 (1997)
  • Ushiku Yukihiro ID: 9000005304238

    株式会社東芝超LSI研究所 (1987 from CiNii)

    Articles in CiNii:1

    • CICC '87 (1987)
  • Ushiku Yukihiro ID: 9000258136431

    Microelectronics Engineering Laboratories, Toshiba Corporation, 1, Komukai Toshiba–cho, Saiwai–ku, Kawasaki 210, Japan (1997 from CiNii)

    Articles in CiNii:1

    • Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure. (1997)
  • Ushiku Yukihiro ID: 9000258140985

    Advanced Semiconductor Devices Research Laboratories, Toshiba Corporation, 1 Komukai Toshiba–cho Saiwai–ku, Kawasaki 210, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Evaluation of 0.3.MU.m Poly-Silicon CMOS Circuits for Intelligent Power IC Application. (1998)
  • Ushiku Yukihiro ID: 9000401662537

    Articles in CiNii:1

    • Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure (1997)
  • Ushiku Yukihiro ID: 9000401664523

    Articles in CiNii:1

    • Agglomeration Resistant Self-Aligned Silicide Process Using N2Implantation into TiSi2 (1997)
  • Ushiku Yukihiro ID: 9000401670565

    Articles in CiNii:1

    • 1998-03-30 (1998)
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