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  • WAKAMIYA Mikio ID: 9000005718103

    Semiconductor Manufacturing Engineering Center, Toshiba Corp. (1997 from CiNii)

    Articles in CiNii:1

    • Diffusion and Segregation of Carbon in SiO_2 Films (1997)
  • Wakamiya Mikio ID: 9000258136408

    Semiconductor Manufacturing Engineering Center, Toshiba Corp., 8, Shinugita–cho, Isogo–ku, Yokohama 235, Japan (1997 from CiNii)

    Articles in CiNii:1

    • Diffusion and Segregation of Carbon in SiO2 Films. (1997)
  • Wakamiya Mikio ID: 9000401662645

    Articles in CiNii:1

    • Diffusion and Segregation of Carbon inSiO2Films (1997)
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