Search Results1-20 of  23

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  • WAKAMIYA Wataru ID: 9000001922836

    Semiconductor Leading Edge Technologies, Inc. (2002 from CiNii)

    Articles in CiNii:1

    • To accomplish 65nm SoC "Asuka" Project (2002)
  • WAKAMIYA Wataru ID: 9000004842885

    Semiconductor Leading Edge Technology, Inc. (2005 from CiNii)

    Articles in CiNii:1

    • Novel via Chain Structure for Failure Analysis at 65 nm-Node Fixing OPC Using Inner and Outer via Chain Dummy Patterns(<Special Section>Microelectronic Test Structures) (2005)
  • WAKAMIYA Wataru ID: 9000004967381

    ULSI Development Center, Mitsubishi Electric Corporation (1998 from CiNii)

    Articles in CiNii:2

    • KrFエキシマ転写技術 (特集"半導体") -- (基盤技術) (1997)
    • Simple Method for Resist CD Prediction (1998)
  • WAKAMIYA Wataru ID: 9000005001162

    Mitsubishi Electric Corporation, ULSI Laboratory (1998 from CiNii)

    Articles in CiNii:4

    • Intrusion Effect of Alkaline Aqueous Solution into Photoresist Film on Adhesion (1996)
    • Resolution enhancement technologies in optical lithography (1998)
    • Lithography. (1997)
  • WAKAMIYA Wataru ID: 9000005593674

    ULSI Development Center, Mitsubishi Electric Corporation (1999 from CiNii)

    Articles in CiNii:11

    • Lithographic Characteristics of an Attenuated Phase-shifting Mask Using a Single-layer Absorptive Shifter (1995)
    • Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask (1998)
    • Impact of Spherical Aberrations on Printing Characteristics of Irregularly Aligned Patterns of Alternating Phase Shift Mask (1999)
  • WAKAMIYA Wataru ID: 9000005715847

    ULSI Laboratory, Mitsubishi Electric Corporation (1994 from CiNii)

    Articles in CiNii:1

    • Proposal of a Next-Generation Super Resolution Technique (1994)
  • WAKAMIYA Wataru ID: 9000252845819

    Mitsubishi Electric Corporation, ULSI Laboratory (1998 from CiNii)

    Articles in CiNii:1

    • Resolution enhancement technologies in optical lithography (1998)
  • WAKAMIYA Wataru ID: 9000253326671

    Mitsubishi Electric Corporation ULSI Laboratory (1997 from CiNii)

    Articles in CiNii:1

    • Lithography (1997)
  • Wakamiya Wataru ID: 9000258120842

    ULSI Laboratory, Mitsubishi Electric Corp., 4–1 Mizuhara, Itami 664 (1994 from CiNii)

    Articles in CiNii:1

    • Effect of Phase Error on Lithographic Characteristics Using AttenuatedPhase-Shifting Mask. (1994)
  • Wakamiya Wataru ID: 9000258120867

    ULSI Laboratory, Mitsubishi Electric Corporation, 4–1 Mizuhara, Itami 664 (1994 from CiNii)

    Articles in CiNii:1

    • Proposal of a Next-Generation Super Resolution Technique. (1994)
  • Wakamiya Wataru ID: 9000258138981

    ULSI Development Center, Mitsubishi Electric Corporation, 4–1 Mizuhara, Itami, Hyogo 664–8641, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask. (1998)
  • Wakamiya Wataru ID: 9000258146555

    ULSI Development Center, Mitsubishi Electric Corporation, 4–1 Mizuhara, Itami, Hyogo 664–8641, Japan (1999 from CiNii)

    Articles in CiNii:1

    • Impact of Spherical Aberrations on Priniting Characteristics of Irregularly Aligned Patterns of Alternating Phase Shift Mask. (1999)
  • Wakamiya Wataru ID: 9000401644717

    Articles in CiNii:1

    • Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask (1994)
  • Wakamiya Wataru ID: 9000401644759

    Articles in CiNii:1

    • Proposal of a Next-Generation Super Resolution Technique (1994)
  • Wakamiya Wataru ID: 9000401660601

    Articles in CiNii:1

    • Adhesion Improvement of Photoresist on TiN/Al Multilayer by Ozone Treatment (1996)
  • Wakamiya Wataru ID: 9000401669310

    Articles in CiNii:1

    • Refractive Index Distribution in Photoresist Thin Film Formed by the Spin Coating Method (1997)
  • Wakamiya Wataru ID: 9000401675043

    Articles in CiNii:1

    • Measurement of Spherical Aberration Utilizing an Alternating Phase Shift Mask (1998)
  • Wakamiya Wataru ID: 9000401675684

    Articles in CiNii:1

    • Quantitative Measurement of the Ray Shift Aspect of Coma Aberration Utilizing Electrical Probe with Zero-Crossing Method (1998)
  • Wakamiya Wataru ID: 9000401675691

    Articles in CiNii:1

    • Measurement Method for Odd Component of Aberration Function Utilizing Alternating Phase Shift Mask (1998)
  • Wakamiya Wataru ID: 9000401675846

    Articles in CiNii:1

    • Simple Method for Resist Critical Dimension Prediction (1998)
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