Search Results1-5 of  5

  • Wakamatsu Goji ID: 9000010734738

    Articles in CiNii:1

    • Freezing material development for double patterning process (2009)
  • Wakamatsu Goji ID: 9000016967981

    Articles in CiNii:1

    • Non topcoat self-freezing photoresist for double patterning process (2010)
  • Wakamatsu Goji ID: 9000257898300

    Fine Electronic Materials Research Laboratories, JSR Corporation (2009 from CiNii)

    Articles in CiNii:1

    • Freezing Material Development for Double Patterning Process (2009)
  • Wakamatsu Goji ID: 9000257898466

    Fine Electronic Materials Research Laboratories, JSR Corporation (2010 from CiNii)

    Articles in CiNii:1

    • Non Topcoat Self-freezing Photoresist for Double Patterning Process (2010)
  • Wakamatsu Goji ID: 9000399803896

    Graduate School of Bio-Applications Systems Engineering, Tokyo University of Agriculture and Technology (2018 from CiNii)

    Articles in CiNii:1

    • Characterization of Pseudo Photorefractive Materials Based on Polyacrylate Containing 9-Oxo-9<i>H</i>-thioxanthene-10,10-dioxide Moiety (2018)
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