Search Results1-20 of  129

  • Yamaoka Tsuguo ID: 9000009564335

    Articles in CiNii:4

    • Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitive Polyimides (1996)
    • Cyclized Copolymer of Methacrylic Anhydride and an Application to Photoresist with Photo-Acid Generator (1999)
    • Synthesis of Cyclized Copolymer from N-Substituted Dimethacrylamide and Application to a Photoresist with a Photo-Acid Generator (2000)
  • Yamaoka Tsuguo ID: 9000009564563

    Articles in CiNii:1

    • Novel Polymeric Resists Based on Vinyl Ether Functionality--Photochemistry and Evaluation as a Lithographic Resist for Synchrotron X-ray and Deep UV (1996)
  • Yamaoka Tsuguo ID: 9000009872275

    Articles in CiNii:1

    • Reactions of Vinyl Ethers and Application to Photoreactive Process (2004)
  • Yamaoka Tsuguo ID: 9000010100023

    Articles in CiNii:1

    • A Novel Negative-tone Photopolymer Based on the Photo-initiated Cationic Polymerization of Epoxides in a Polymer Film (2005)
  • YAMAOKA TSUGUO ID: 9000253031069

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1991 from CiNii)

    Articles in CiNii:1

    • A novel chemical amplification type positive resist using diphenyliodonium 9,10-dimethoxyanthracene-2-sulphonate as photoinitiator. (1991)
  • YAMAOKA Tsuguo ID: 9000000795735

    Department of Information and Image Sciences, Faculty of Engineering, Chiba University (2005 from CiNii)

    Articles in CiNii:5

    • Laser Flash Photolysis in High-Speed Photopolymer Coating Laysrs (1995)
    • Laser Flash Photolysis in High-Speed Photopolymer Coating Layers: Effects of Incorporating Dimethyl Phthalate as a Plasticizer into Coating Formulation (1996)
    • Laser-Flash Photolysis in IIigh-Speed Photopolymer Coating Layers Containing Carbonylbiscoumarin Dyes and 2,2'-Bis(2-chlorophenyl)-4,4',5,5' -tetraphenyl- 1 ,1' -bi-1H-imidazole (1997)
  • YAMAOKA Tsuguo ID: 9000002316070

    千葉大学工学部情報画像工学科 (2004 from CiNii)

    Articles in CiNii:32

    • Styryl Dye Photosensitizer for Laser-Induced Photopolymerization (1995)
    • Characteristic Behaviors of Trifunctional Vinyl Ether Urethane Monomer in Protic and Aprotic Polymer Matrices (1995)
    • Three Components' Photoresist Comprising a Vinyl Ether Urethane Derivative-Effects of Vinyl Ether Functionality on Photopolymeric Properties (1995)
  • YAMAOKA Tsuguo ID: 9000005623870

    Deparment of Omage Science and Technology Faculty of Engineering (1989 from CiNii)

    Articles in CiNii:1

    • Sulfonamide-Phenolic Resin Negative Resist for KrF Excimer Laser Lithography : Resist Material and Process : (1989)
  • YAMAOKA Tsuguo ID: 9000021356799

    Chiba Univ., Fac. of Eng. (1991 from CiNii)

    Articles in CiNii:1

    • Special Issue/Printing and Copy. Trend in Printing Systems. (1991)
  • YAMAOKA Tsuguo ID: 9000107374206

    Department of Image Science, Faculty of Engineering, Chiba University (1998 from CiNii)

    Articles in CiNii:1

    • Photoalignment Films of Polyesters with Photoreactive Main Chain (1998)
  • YAMAOKA Tsuguo ID: 9000242096390

    Department of Image Science and Technology, Chiba University (1984 from CiNii)

    Articles in CiNii:1

    • Photosensitive Polymer Materials (1984)
  • YAMAOKA Tsuguo ID: 9000252776881

    Department of Image Science, Chiba University (1995 from CiNii)

    Articles in CiNii:1

    • Synthesis of Xanthene Dye-Peroxybenzoate and Mechanism of Radical Generation. (1995)
  • YAMAOKA Tsuguo ID: 9000253027931

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1988 from CiNii)

    Articles in CiNii:1

    • SENSITIZED PHOTOLYSIS AND TRIPLET ENERGY OF ETHYL P-AZIDOBENZOATE (1988)
  • YAMAOKA Tsuguo ID: 9000253027935

    Faculty of Engineering, Chiba University (1988 from CiNii)

    Articles in CiNii:1

    • APPLICATION OF PHOTOSENSITIVE SILICONE-CONTAINING GRAFT POLYMERS SYNTHESIZED FROM MACROMONOMER TO MICRO LITHOGRAPHY (1988)
  • YAMAOKA Tsuguo ID: 9000253031899

    Department of Image Science, Faculty of Engineering, Chiba University (1994 from CiNii)

    Articles in CiNii:1

    • Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitive Polymers. (1994)
  • YAMAOKA Tsuguo ID: 9000253031963

    Department of Image Science, Chiba University|Fuji Photographic Films Co., Ltd. (1994 from CiNii)

    Articles in CiNii:1

    • Dual-mode Behavior of Vinyl Ether Functionalized Photoresist. (1994)
  • YAMAOKA Tsuguo ID: 9000254398057

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1987 from CiNii)

    Articles in CiNii:1

    • Studies on photosensitive azido polymer. IV Effect of molecular structure on photocrosslinking efficiency of azido polymer. (1987)
  • YAMAOKA Tsuguo ID: 9000254929749

    Faculty of Engineering, Chiba University (1978 from CiNii)

    Articles in CiNii:1

    • Effect of Distribution of Molecular Weight on Photosensitivity of Poly [2- (<I>p</I>-azidobenzoyloxy) ethyl methacrylate] (1978)
  • YAMAOKA Tsuguo ID: 9000254930247

    Faculty of Engineering, Chiba University (1980 from CiNii)

    Articles in CiNii:1

    • Effect of Photocrosslinking on Mechanical Properties of Poly (vinyl cinnamate) (1980)
  • YAMAOKA Tsuguo ID: 9000254931866

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1987 from CiNii)

    Articles in CiNii:1

    • Studies on photosensitive azido polymer. III Photocrosslinking reaction of cyclized polyisoprene polymer sensitized with aromatic azido compound. (1987)
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