Search Results81-100 of  129

  • Yamaoka Tsuguo ID: 9000253029751

    Department of Information and Image Science, Faculty of Engineering Chiba University (2000 from CiNii)

    Articles in CiNii:1

    • Substituent Effect in Sensitization Mechanisms of Pyrromethene Dyes in Solution. (2000)
  • Yamaoka Tsuguo ID: 9000253029774

    Department of Information and Image Science, Faculty of Engineering, Chiba University (2000 from CiNii)

    Articles in CiNii:1

    • Effect of Ethyl group in Sensitization Mechanisms of Pyrromethene Dyes in Photopolymer Coating Layer. (2000)
  • Yamaoka Tsuguo ID: 9000253029916

    Department of Information and Image Sciences, Faculty of Engineering, Chiba University (2001 from CiNii)

    Articles in CiNii:1

    • Dye Sensitized Photo-Acid Generation for 633nm-Sensitive Positive-Working Photopolymer. (2001)
  • Yamaoka Tsuguo ID: 9000253029925

    Department of Information and Image Sciences, Faculty of Engineering, Chiba University (2001 from CiNii)

    Articles in CiNii:1

    • Carbazole as Photo-Sensitizer in Photoresist. (2001)
  • Yamaoka Tsuguo ID: 9000253029930

    Department of Information and Image Science, Faculty of Engineering, Chiba University (2001 from CiNii)

    Articles in CiNii:1

    • Three-Component Photo Radical Initiating Systems. The Effect Accelerator.:The Effect of Accelerator (2001)
  • Yamaoka Tsuguo ID: 9000253029938

    Department of Information and Image Science, Faculty of Engineering, Chiba University (2001 from CiNii)

    Articles in CiNii:1

    • Sensitization Mechanisms of 1,7,13-Trimethyl-2,5,9,12-tetrahydro-2,5;9,12-diethano-isoindolomethene Difluoroborate in Photopolymer Coating Layer: Effect in Sensitization Mechanisms with Incorporating Bicyclo[2,2,2]octene Group into Bipyrromethene Difluoroborate. (2001)
  • Yamaoka Tsuguo ID: 9000253030485

    Department of Information and Image Sciences, Faculty of Engineering, Chiba University (2002 from CiNii)

    Articles in CiNii:1

    • Trivalent Iodine Compounds and Periodonium Salt as PAG. (2002)
  • Yamaoka Tsuguo ID: 9000253030719

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1989 from CiNii)

    Articles in CiNii:1

    • Preparation and properties of positive photosensitive polyimides containing o-naphthoquinonediazide in the polymer side chains. (1989)
  • Yamaoka Tsuguo ID: 9000253030777

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1989 from CiNii)

    Articles in CiNii:1

    • Nanosecond time-resolved spectroscopic study on the photochemical conversion of 1,2-naphthoquinonediazides. (1989)
  • Yamaoka Tsuguo ID: 9000253031017

    Image Science and Technology, Faculty of Engineering, Chiba University (1991 from CiNii)

    Articles in CiNii:1

    • An aqueous base developable novel deep-UV resist for KrF excimer laser lithography. (1991)
  • Yamaoka Tsuguo ID: 9000253031242

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1992 from CiNii)

    Articles in CiNii:1

    • Photosensitive Polyimide Protected by Tetrahydropyranyl Group Based on Chemical Amplification. (1992)
  • Yamaoka Tsuguo ID: 9000253031254

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1992 from CiNii)

    Articles in CiNii:1

    • Photoreactive Fluorinated Polyimide Protected by Tetrahydropyranyl Group(THP) Based on Photoinduced Acidolysis. Properties and kinetics for acidolysis.:Properties and kinetics for acidolysis (1992)
  • Yamaoka Tsuguo ID: 9000253031447

    Deparment of Imaging Science, Faculty of Engineering, Chiba University (1993 from CiNii)

    Articles in CiNii:1

    • Highly Sensitive Photopolymerization System with Functional Microgel. (1993)
  • Yamaoka Tsuguo ID: 9000253031489

    Department of Image Science, Chiba University|Institute of Synthetic Technology, Nitto Denko Co. (1993 from CiNii)

    Articles in CiNii:1

    • Recent developments and difficulties of photosensitive polyimides. (1993)
  • Yamaoka Tsuguo ID: 9000253031634

    Department of Image Science and Technology, Faculty of Engineering Chiba University (1993 from CiNii)

    Articles in CiNii:1

    • Novel photoresists based on isopropenyloxy carbonyl functionality. (1993)
  • Yamaoka Tsuguo ID: 9000253032044

    Department of Image Science, Faculty of Engineering, Chiba University (1995 from CiNii)

    Articles in CiNii:1

    • Effect of residual solvent on pattern profile and mechanical characteristic of photosensitive polyimides. (1995)
  • Yamaoka Tsuguo ID: 9000253032509

    Department of Image Science, Chiba Univesity|Tsukuba Reseach Laboratory, SORTEC Co. (1996 from CiNii)

    Articles in CiNii:1

    • Novel Polymeric Resists Based on Vinyl Ether Functionality. Photochemistry and Evaluation as A Lithographic Resist for Synchrotron X-ray and Deep UV.:Photochemistry and Evaluation as A Lithographic Resist for Synchrotron X-ray and Deep UV (1996)
  • Yamaoka Tsuguo ID: 9000253131332

    Department of Image Science and Technology, Faculty of Engineering, Chiba University (1986 from CiNii)

    Articles in CiNii:1

    • Magnetic field effect on photocrosslinking reaction of bromo- and chloromethylated polystyrene. (1986)
  • Yamaoka Tsuguo ID: 9000254051060

    Dept. of Imag. Sci., Chiba University (1994 from CiNii)

    Articles in CiNii:1

    • Thermally Stable Photopolymers for Electronics. Molecular Design and Performance of Photosensitive Polyimides.:—Molecular Design and Performance of Photosensitive Polyimides— (1994)
  • Yamaoka Tsuguo ID: 9000255699554

    Department of Image Science, Facutly of Engineering, Chiba University (1997 from CiNii)

    Articles in CiNii:1

    • Laser-Flash Photolysis in High-Speed Photopolymer Coating Layers Containing Carbonylbiscoumarin Dyes and 2,2'-Bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,1'-bi-lH-imidazole. (1997)
Page Top