Search Results1-9 of  9

  • YOSHIDA Nobuhide ID: 9000004753336

    Device Platforms Research Labs, NEC Corp. (2009 from CiNii)

    Articles in CiNii:34

    • Adaptive Control of EDC Using Dispersion Estimation Technique with 43Gbit/s Eye Monitoring LSI (2009)
    • Design of GaAs Motion Vector Estimation Circuit (1999)
    • Design of GaAs Motion Vector Estimation Circuit (1999)
  • YOSHIDA Nobuhide ID: 9000004818413

    NEC Corporation (2000 from CiNii)

    Articles in CiNii:3

    • ECL-Compatible Low-Power-Consumption 10-Gb/s GaAs 8:1 Multiplexer and 1:8 Demultiplexer (1999)
    • 0.21-fJ GaAs DCFL Circuits Using 0.2-μm Y-Shaped Gate AlGaAs/InGaAs E/D-HJFETs (1999)
    • Low-Voltage, Low-Power, High-Speed 0.25-μm GaAs HEMT Delay Flip-Flops (2000)
  • Yoshida Nobuhide ID: 9000252983018

    Department of Electrical Engineering, Faculty of Science and Technology, Keio University (1992 from CiNii)

    Articles in CiNii:1

    • Chemical Vapor Deposition of Cu Film on SiO<SUB>2</SUB> Using Cyclopentadienylcoppertriethylphosphine (1992)
  • Yoshida Nobuhide ID: 9000283158488

    Articles in CiNii:1

    • Low-Pressure Metalorganic Chemical Vapor Deposition of a CuGaSe2/CuAlSe2 Heterostructure. (1994)
  • Yoshida Nobuhide ID: 9000283158626

    Articles in CiNii:1

    • Surface Passivation of In0.52Al0.48As Using (NH4)2Sx and P2S5/(NH4)2S. (1994)
  • Yoshida Nobuhide ID: 9000392732153

    Articles in CiNii:1

    • Chemical Vapor Deposition of Cu Film on SiO<SUB>2</SUB> Using Cyclopentadienylcoppertriethylphosphine (1992)
  • Yoshida Nobuhide ID: 9000401631864

    Articles in CiNii:1

    • Chemical Vapor Deposition of Cu Film on SiO2Using Cyclopentadienylcoppertriethylphosphine (1992)
  • Yoshida Nobuhide ID: 9000401640096

    Articles in CiNii:1

    • Surface Passivation ofIn0.52Al0.48AsUsing(NH4)2SxandP2S5/(NH4)2S (1994)
  • Yoshida Nobuhide ID: 9000401646621

    Articles in CiNii:1

    • Low-Pressure Metalorganic Chemical Vapor Deposition of a $\bf CuGaSe_{2}/CuAlSe_{2}$ Heterostructure (1994)
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