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  • YOUDA Satoko ID: 9000000966587

    Department of Materials Processing and Engineering, Graduate School of Engineering, Nagoya University (2002 from CiNii)

    Articles in CiNii:1

    • Alkyl Self-assembled Monolayer Prepared on Hydrogen-terminated Si(111)through Reduced Pressure Chemical Vapor Deposition : Chemical Resistivities in HF and NH_4F Solutions (2002)
  • Youda Satoko ID: 9000257717576

    Department of Materials Processing and Engineering, Graduate School of Engineering, Nagoya University (2002 from CiNii)

    Articles in CiNii:1

    • Alkyl Self-assembled Monolayer Prepared on Hydrogen-terminated Si(111) through Reduced Pressure Chemical Vapor Deposition: Chemical Resistivities in HF and NH4F Solutions. (2002)
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