Search Results1-9 of  9

  • YOSHINO Hisakazu ID: 9000005716195

    manufacturtng engtneertng rearch center, toshiba corp., (1994 from CiNii)

    Articles in CiNii:1

    • Mask Defect Inspection Method by Database Comparison with 0.25 -0.35 μm Sensitivity (1994)
  • YOSHINO Hisakazu ID: 9000020743115

    Articles in CiNii:1

    • The Estimation and Improvement of TTL Alignment Error Budgets for an Excimer Laser Aligner. (1993)
  • YOSHINO Hisakazu ID: 9000022197895

    Articles in CiNii:1

    • TTL Alignment for Excimer Laser Aligner. Real-Time SMART with Correcting Lateral Chromatic Aberration.:Real-Time SMART with Correcting Lateral Chromatic Aberration (1993)
  • Yoshino Hisakazu ID: 9000020798258

    Articles in CiNii:1

    • An Excimer Laser Stepper with Through-the-Lens Alignment. (1993)
  • Yoshino Hisakazu ID: 9000252981076

    Technical Research Institute, Topcon Corporation (1992 from CiNii)

    Articles in CiNii:1

    • 0.05 μm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System (1992)
  • Yoshino Hisakazu ID: 9000258120878

    Technical Research Institute, Topcon Corp., 75–1 Hasumuma–cho, Itabashi–ku, Tokyo 174 (1994 from CiNii)

    Articles in CiNii:1

    • Mask Defect Inspection Method by Database Comparison with 0.25-0.35 .MU.m Sensitivity. (1994)
  • Yoshino Hisakazu ID: 9000392720255

    Articles in CiNii:1

    • 0.05 μm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System (1992)
  • Yoshino Hisakazu ID: 9000401629916

    Articles in CiNii:1

    • 1992-12-30 (1992)
  • Yoshino Hisakazu ID: 9000401645071

    Articles in CiNii:1

    • 1994-12-30 (1994)
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