書誌事項
- タイトル別名
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- Development of the LIGA Process using a Superconducting Compact Synchrotron Light Source
- 超電導小形シンクロトロン光源を用いたLIGAプロセスの開発
- チョウデンドウ コガタ シンクロトロン コウゲン オ モチイタ LIGA プロ
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This paper is devoted to the description of the LIGA process using a 600MeV superconducting compact synchrotron light source. The realization of deep-etch x-ray lithography is based on a new resist and mask. The resist is made of a copolymer of methyl methacrylate (MMA) and methacryl acid (MAA). The main benefit is its high sensitivity, which is one order of magnitude greater than that of polymethyl methacrylate (PMMA) used in the LIGA process. The mask is composed of a 2μm -thick silicon nitride membrane with high transparency supporting tungsten absorber which is a 5μm-thick. Experimental results about deep-etch x-ray lithography, electroforming and molding techniques are presented. Micro-ultrasonic transmitter obtained with these techniques is also shown. The purpose of this study is the realization of low cost micro-components for a variety of industrial applications.
収録刊行物
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- 電気学会論文誌C(電子・情報・システム部門誌)
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電気学会論文誌C(電子・情報・システム部門誌) 116 (12), 1334-1340, 1996
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679584936320
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- NII論文ID
- 10001787399
- 130006844020
- 10004029856
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- NII書誌ID
- AN10065950
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- ISSN
- 13488155
- 03854221
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- NDL書誌ID
- 4086773
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- データソース種別
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- NDL
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