Preparation of Iron Nitride with Ion Implantation.

• Kikkawa Shinichi

  ISIR, Osaka University

• Ohmura Takashi

  ISIR, Osaka University

• Sugiyama Hideyuki

  ISIR, Osaka University

• Kanamaru Fumikazu

  ISIR, Osaka University

• Hinomura Tohru

  Fac. Eng. Sci., Osaka University

• Nasu Saburo

  Fac. Eng. Sci., Osaka University

Bibliographic Information

Other Title

• 磁性材料の化学　イオン注入法による窒化鉄の生成
• イオン チュウニュウホウ ニヨル チッカ テツ ノ セイセイ

Abstract

Formation of iron nitrides, especially Fe₁₆N₂, was investigated by nitrogen ion implantation for α-Fe sheet. The implanted nitrogen was lost during the process in the high energy implantation because of the thermal instability of iron nitrides. N₊ ion implantation with a beam voltage of less than 100keV and its current of less than 5μA was effective for the Fe₁₆N₂ formation. Successive annealing in vacuum at 100°C improved its crystallinity. The formation was explicitly detected by XRD for thin film with an incident beam angle of 1 degree. It was also observed on the N₊ ion implantated α-Fe(211) preferred oriented thin film with a thickness of about 1μm deposited on capton film by rf-sputter deposition. The presence of Fe₁₆N₂ was detected by XRD, but Mossbauer spectroscopy did not show clearly its presence in the as implanted product. Further annealing is necessary to obtain a well crystallized Fe₁₆N₂.

Journal

• Journal of the Japan Society of Powder and Powder Metallurgy

  Journal of the Japan Society of Powder and Powder Metallurgy 43 (1), 95-100, 1996

  Japan Society of Powder and Powder Metallurgy

Keywords

• iron nitride
• Fe<SUB>16</SUB>N<SUB>2</SUB>
• ion implantation
• thin film X-ray diffraction

Details

• CRID: 1390001206308682880
• NII Article ID: 10002011145
• NII Book ID: AN00222724
• DOI: 10.2497/jjspm.43.95
• ISSN: 18809014
• ISSN: 05328799
• NDL BIB ID: 3918041
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I3918041
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed