Formation of a Positive Photoresist Thin Film by Spin Coating. Influence of the Viscosity.

• YADA Toshio

  Advanced Technology R&D Center, Mitsubishi Electric Corporation

• AOKI Masaru

  Advanced Display Incorporated

• MAEJIMA Taro

  Advanced Display Incorporated

Bibliographic Information

Other Title

• 回転塗布によるポジ型レジスト薄膜形成
• Formation of a Positive Photoresist Thin Film by Spin Coating
• Formation of a Positive Photoresist Thi
• Influence of the Viscosity

Abstract

Experimental film formation with a positive photoresist solution having various viscosities on wafers by spin coating was investigated. The baked films formed with the lower viscosities are thinner thicknesses at any spinning time due to the higher rates of outflow in the initial stage of the spinning and the higher rates of evaporation in the intermediate stages. Their minimum thickness deviations, which exist in the intermediate stages of the spinning, decrease and change to earlier stages. Those phenomena are more distinct at lower spin speeds.

Journal

• Journal of Printing Science and Technology

  Journal of Printing Science and Technology 34 (3), 155-163, 1997

  The Japanese Society of Printing Science and Technology

Details

• CRID: 1390001204090042496
• NII Article ID: 130004069213
• NII Article ID: 10002020796
• NII Book ID: AN10161648
• DOI: 10.11413/nig1987.34.155
• ISSN: 18824935
• ISSN: 09143319
• NDL BIB ID: 4276044
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4276044
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • CiNii Articles
• Abstract License Flag: Disallowed