Electrodeposition of Soft Magnetic Ni-Fe-based Film with High Resistivity.

• TAKAI Madoka

  School of Sci. and Eng., Waseda Univ.

• KONDO Akira

  School of Sci. and Eng., Waseda Univ.

• MERA Fumiaki

  School of Sci. and Eng., Waseda Univ.

• KASEDA Manabu

  School of Sci. and Eng., Waseda Univ.

• OSAKA Tetsuya

  School of Sci. and Eng., Waseda Univ. Kagami Memorial Lab. for Materials Sci. and Technol., Waseda Univ.

Bibliographic Information

Other Title

• 電析法による高比抵抗Ｎｉ‐Ｆｅ系軟磁性薄膜の作成
• デンセキホウ ニヨル コウ ヒテイコウ Ni-Feケイ ナンジセイ ハクマク

Abstract

We attempted to increase resistivity (ρ) while maintaing good soft magnetic properties by using industrial-grade permalloy (Ni₈₀Fe₂₀) as a core material. We added diethylenetriamine (DET) as an organic additive to NiFe bath to increase resistivity. The adding of 3∼4ppm of DET produced a film with resistivity three times resistivity as high as Ni₈₀Fe₂₀, and the higher resistivity film retained the good soft magnetic properties due to the codeposition of small amounts of carbon and sulfur. Increased resistivity was caused because the resulting microstructure contained more minute crystal grains than the conventional microstructure. The higher resistivity NiFe film exhibits higher permeability than that of conventional Ni₈₀Fe₂₀ film above 30MHz because eddy current loss is suppresed.

Journal

• Journal of The Surface Finishing Society of Japan

  Journal of The Surface Finishing Society of Japan 49 (3), 292-296, 1998

  The Surface Finishing Society of Japan

Keywords

• Electrodeposition
• NiFe Films
• High Resistivity
• Soft Magnetic Property
• Organic Additive

Details

• CRID: 1390282679091650432
• NII Article ID: 10002108790
• NII Book ID: AN1005202X
• DOI: 10.4139/sfj.49.292
• COI: 1:CAS:528:DyaK1cXhs1erurY%3D
• ISSN: 18843409
• ISSN: 09151869
• ISSN: http://id.crossref.org/issn/09151869
• NDL BIB ID: 4413782
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4413782
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed