Interpretation of Inductive Loop in Electrochemical Impedance during Metal Deposition.

• ITAGAKI Masayuki

  Fac. of Science and Technology, Science Univ. of Tokyo

• WATANABE Kunihiro

  Fac. of Science and Technology, Science Univ. of Tokyo

• KOURA Nobuyuki

  Fac. of Science and Technology, Science Univ. of Tokyo

Bibliographic Information

Other Title

• 金属の析出反応での電気化学的インピーダンスで観察される誘導性挙動の理論的解釈
• キンゾク ノ セキシュツ ハンノウ デ ノ デンキ カガクテキ インピーダンス

Abstract

The origin of inductive behavior in electrochemical impedance during metal deposition was discussed based on numerical analysis. Impedance was calculated by the modulation of adsorption coverage Δθ/ΔE as follows: 1/Z=A_F+jωC_dl, A_F=a_A1+a_A2 Δθ/ΔE, Δθ/ΔE=aθ1(jωa_θ2+1), where A_F is admittance, C_dl capacitance of electric double layer, ω angular frequency, and a_i constant. Results of calculation indicate that the following adsorption processes are related to inductive behavior in metal deposition: (i) adsorbed intermediate in consecutive reaction, (ii) cathodic adsorbed species as catalyst, and (iii) anodic adsorbed inhibitor.

Journal

• Journal of The Surface Finishing Society of Japan

  Journal of The Surface Finishing Society of Japan 49 (8), 900-904, 1998

  The Surface Finishing Society of Japan

Keywords

• Electrochemical Impedance Spectroscopy (EIS)
• Inductive loop
• Deposition

Details

• CRID: 1390001204115224064
• NII Article ID: 10002110343
• NII Article ID: 10007792972
• NII Book ID: AN1005202X
• DOI: 10.4139/sfj.49.900
• COI: 1:CAS:528:DyaK1cXltF2qt7o%3D
• ISSN: 18843409
• ISSN: 09151869
• ISSN: http://id.crossref.org/issn/09151869
• NDL BIB ID: 4546115
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4546115
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed