高周波誘導型高密度プラズマを用いた純鉄の窒化

• 山田 仁子

  東京理科大学理工学部

• 伊藤 滋

  東京理科大学理工学部

• 明石 和夫

  東京理科大学理工学部

書誌事項

タイトル別名

• Nitriding of Pure Iron in High-density Plasma Using Inductively Coupled Radio Frequency Discharge.
• コウシュウハ ユウドウガタ コウミツド プラズマ オ モチイタ ジュンテツ ノ チッカ

抄録

High-density RF induction plasma having a density of 10¹³cm^-3 was generated using 13.56MHz 350W RF power Anticipating the effect of high-density ions, we applied the high-density nitrogen plasma to surface nitriding of iron A nitrided layer consisting of Fe₃N and Fe₄N was obtained at 550°C without applying a bias voltage When -200V of bias voltage was applied to the iron substrate, the main product at the surface was Fe₃N having a higher nitrogen content than Fe₃N obtained without bias voltage This bias voltage enabled us to nitride the iron surface even at 350°C The Vickers hardness of the surface obtained by conventional low-density plasma at 550°C was 360Hv Using high-density plasma, we obtained 980Hv Vickers hardness increased to 1390Hv when we applied a bias voltage of -100V The maximum hardness, 1410Hv, was obtained at 550°C by applying -200V The Vickers hardness of the surface prepared at 350°C with -200V bias voltage was 970Hv, comparable to that prepared at 550°C with no bias voltage The thickness of the nitriding layer obtained at 550°C with a bias voltage of -200V was 1.9μm, thinner than that obtained by conventional plasma under the same nitriding conditions We concluded that a large amount of nitrogen ion species in the high-density plasma significantly affects iron nitriding, especially surface hardness

収録刊行物

• 表面技術

  表面技術 50 (2), 195-199, 1999

  一般社団法人 表面技術協会

キーワード

• High-density Plasma
• Surface Hardening
• Iron Nitriding

詳細情報

• CRID: 1390001204115081344
• NII論文ID: 10002111870
• NII書誌ID: AN1005202X
• DOI: 10.4139/sfj.50.195
• ISSN: 18843409
• ISSN: 09151869
• NDL書誌ID: 4658137
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4658137
• 本文言語コード: ja
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可