高輝度放射光ＳＰｒｉｎｇ‐８における半導体材料プロセス研究への期待

• 奥山 雅則

  大阪大学基礎工学研究科物理系専攻機能材料デバイス講座

書誌事項

タイトル別名

• Semiconductor Material Processes in Synchrotron Radiation SPring-8.
• コウ キド ホウシャコウ SPring-8 ニ オケル ハンドウタイ ザイリョ

抄録

Material processes related to semiconductor device manufacturing in research project in synchrotron radiationfacility, SPring-8, have been discussed. SPring-8 has 61 beamlines including 23 bending magnet beamlinesand 38 insertion device beamlines. Soft X-ray beamline in SPring-8 will be available for the materialprocessing near future and has 8-figure undulator which radiates strong polarized soft X-ray in energy range of 0.5-5 keV. Possibilities of the SR research are discussed showing the reported results. Research plans such as SR-CVD, SR-etching, surface modification, SR-ablation and their analyses have been proposed as effectivesubjects.

収録刊行物

• レーザー研究

  レーザー研究 26 (6), 444-448, 1998

  一般社団法人 レーザー学会

キーワード

• Synchrotron radiation
• Semiconductor process
• SPring-8

詳細情報

• CRID: 1390001204647034752
• NII論文ID: 10002249585
• NII書誌ID: AN00255326
• DOI: 10.2184/lsj.26.444
• ISSN: 13496603
• ISSN: 03870200
• NDL書誌ID: 4511847
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4511847
• Web Site: http://www.jstage.jst.go.jp/article/lsj1973/26/6/26_6_444/_pdf
• 本文言語コード: ja
• データソース種別:
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  • NDL
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  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可