UV Light-Induced Decomposiffon and Polymerization of Organosilicon Compounds.

• NIWANO Michio

  <I>Research Institute of Electrical Communication, Tohoku University</I>

• MIYAMOTO Nobuo

  <I>Faculty of Engineering, Tohoku-Gakuin University</I>

Bibliographic Information

Other Title

• 有機珪素化合物の光分解・重合プロセス
• ユウキ ケイソ カゴウブツ ノ ヒカリ ブンカイ ジュウゴウ プロセス

Abstract

The application of photochemical reaction for depositing SiC thin films fromorganosilicon compounds at lowtemperatures has been exploited. Methylsilane Si (CH₃) ₄, allylmethylsilane CH₂=CHCH₂Si (CH₃) ₃ andtriethylsilane SiH (C₂H₅) ₃ are utilized as precursors for the deposition of SiC films. Synchrotron radiation (SR) in the vacuum-ultraviolet (VUV) region are used as the exciting light source. We usephoton-stimulateddesorption (PSD) and infrared (IR) spectroscopy to follow chemical changes of condencedlayers of organosiliconcaused by UV and VUV-SR irradiation. PSD data demonstrate that UV and VUV irradiation initiates thedesorption of hydrogen and carbon fragments, an indication that the photofragmentation of the organosilicon compounds occur upon UV and VUV irradiation. IR data show that Si-containing photofragments arepolymerized to form amorphous SiC.

Journal

• The Review of Laser Engineering

  The Review of Laser Engineering 26 (6), 463-467, 1998

  The Laser Society of Japan

Keywords

• Photochemical reaction
• Synchrotron radiation
• Organosilicon compounds
• SiC

Details

• CRID: 1390282679623715968
• NII Article ID: 10002249647
• NII Book ID: AN00255326
• DOI: 10.2184/lsj.26.463
• ISSN: 13496603
• ISSN: 03870200
• NDL BIB ID: 4511851
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4511851
• Web Site: http://www.jstage.jst.go.jp/article/lsj1973/26/6/26_6_463/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed