Plasmaless Dry Cleaning of CVD System with Fluorine-Containing Gases.

• MOURI Isamu

  Chemical Res. Center, Central Glass Co., Ltd.

• FUJII Tsukasa

  Chemical Res. Center, Central Glass Co., Ltd.

• KOBAYASHI Yoshiyuki

  Technical Planning Section, Central Chemical Co., Ltd.

• HAYAKAWA Seiji

  Fac. of Agriculture, Yamaguchi Univ.

Bibliographic Information

Other Title

• フッソ素系ガスによる薄膜堆積装置のクリーニング
• フッソケイ ガス ニヨル ハクマク タイセキ ソウチ ノ クリーニング

Journal

• Journal of The Surface Finishing Society of Japan

  Journal of The Surface Finishing Society of Japan 47 (6), 493-497, 1996

  The Surface Finishing Society of Japan

Keywords

• Fluoridation
• Environmental Protection
• ClF₃
• HF
• NF₃

Details

• CRID: 1390001204115818880
• NII Article ID: 10002256485
• NII Book ID: AN1005202X
• DOI: 10.4139/sfj.47.493
• ISSN: 18843409
• ISSN: 09151869
• NDL BIB ID: 3976390
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I3976390
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles