Effect of Chemical Etching on Protium Absorbing Properties and Electrochemical Characteristics of LaNi5 Alloys.

• Tamura Takuya

  Graduate School, Tohoku University

• Kuriiwa Takahiro

  Graduate School, Tohoku University

• Takamura Hitoshi

  Graduate School of Engineering, Tohoku University

• Nakamura Hazime

  Graduate School of Engineering, Tohoku University

• Okada Masuo

  Graduate School of Engineering, Tohoku University

Bibliographic Information

Other Title

• ＬａＮｉ５系合金のプロチウム吸蔵特性および電気化学特性に及ぼす化学的エッチングの影響
• LaNi5ケイ ゴウキン ノ プロチウムキュウゾウ トクセイ オヨビ デンキ カガク トクセイ ニ オヨボス カガクテキ エッチング ノ エイキョウ

Abstract

When hydrogen storage alloy is used as a negative electrode of nickel-metal hydride batteries, protium absorbing properties at a negative electrode is different from those at a gas phase because of the formation of oxide layers and a nickel-rich layer on the surface of the alloy due to charge and discharge. This paper investigates the effect of surface chemical etching on protium absorbing properties and electrochemical characteristics of LaNi₅ alloys. Dilute HCI solution under 1% was used as etchants for the formation of a nickel-rich layer which works as a protection surface of the alloy against the KOH electrolyte. Protium absorbing properties of annealed LaNi₅ samples which were etched shortly with 0.2N HCl or 0.02N HCl were better protium storage capacity than those of unetched annealed LaNi₅ samples. Electrochemical characteristics of annealed LaNi₅ samples which were etched for 60min with 0.02N HCl were better cycle stability than those of unetched annealed LaNi₅ samples.

Journal

• Journal of the Japan Society of Powder and Powder Metallurgy

  Journal of the Japan Society of Powder and Powder Metallurgy 46 (2), 131-137, 1999

  Japan Society of Powder and Powder Metallurgy

Keywords

• hydrogen storage alloy
• nickel-metal hydride batteries
• nickel-rich layer
• chemical etching

Details

• CRID: 1390001206308679552
• NII Article ID: 10002261789
• NII Book ID: AN00222724
• DOI: 10.2497/jjspm.46.131
• ISSN: 18809014
• ISSN: 05328799
• NDL BIB ID: 4655497
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4655497
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed