Molecular Dynamics Simulation of Electromigration in Nano-sized Metal Lines

• OHKUBO Tadakatsu

  The Institute of Scientific and Industrial Research, Osaka University

• HIROTSU Yoshihiko

  The Institute of Scientific and Industrial Research, Osaka University

• NIKAWA Kiyoshi

  A&E Technology Center, NEC Corporation

収録刊行物

• Materials transactions, JIM

  Materials transactions, JIM 37 (3), 454-457, 1996-03

キーワード

• electromigration
• molecular dynamics simulation
• metal line
• electric field
• diffusion
• drift velocity

詳細情報

• CRID: 1572543023949895424
• NII論文ID: 10002447826
• NII書誌ID: AA10699969
• ISSN: 09161821
• 本文言語コード: en
• データソース種別:
  • CiNii Articles