LiNbO3 Thin Film Prepared by Pulsed Laser Deposition.

• KAKEHI Yoshiharu

  Technology Research Institute of Osaka Prefecture

• OKAMOTO Akio

  Technology Research Institute of Osaka Prefecture

• SAKURAI Yoshiaki

  Technology Research Institute of Osaka Prefecture

• NISHIKAWA Yoshito

  Technology Research Institute of Osaka Prefecture

• OGAWA Souichi

  Technology Research Institute of Osaka Prefecture

• YOTSUYA Tsutom

  Osaka Science and Technology Center

Bibliographic Information

Other Title

• レーザアブレーション法を用いたＬｉＮｂＯ３薄膜の作製
• レーザアブレーションホウ オ モチイタ LiNbO3 ハクマク ノ サクセイ

Abstract

A LiNbO₃ thin film was successfully fabricated onto a sapphire (001) substrate using pulsed laser deposition. The film quality was largely affected by substrate temperature, oxygen gas pressure, laser fluence and laser repetition frequency. By adjusting these conditions, a highly c-axis oriented LiNbO₃ film was obtained. The ordinary refractive index of the film became 2.28 at 632.8 nm of wavelength, which coincided with that of a LiNbO₃ single crystal. RHEED observation showed the film had twin boundaries. Further improvements are now undergoing.

Journal

• Shinku

  Shinku 42 (3), 261-264, 1999

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390282679040451968
• NII Article ID: 10002476415
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.42.261
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 4714965
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4714965
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed