TiC Film Preparation by Alternate Deposition of Ti and C with Dual Magnetron Sputtering Method.
-
- SATO Akishige
- AMS R&D C, Kanazawa Institute of Technology
-
- SAWAHIRA Yoshihiro
- AMS R&D C, Kanazawa Institute of Technology
-
- KIKUCHI Naoto
- AMS R&D C, Kanazawa Institute of Technology
-
- KUSANO Eiji
- AMS R&D C, Kanazawa Institute of Technology
-
- NANTO Hidehito
- AMS R&D C, Kanazawa Institute of Technology
-
- KINBARA Akira
- AMS R&D C, Kanazawa Institute of Technology
Bibliographic Information
- Other Title
-
- 固体炭素源を用いた2元交互スパッタリングによるTiC薄膜の作製
- コタイ タンソゲン オ モチイタ 2ゲン コウゴ スパッタリング ニ ヨル TiC ハクマク ノ サクセイ
Search this article
Abstract
Titanium Carbide films have been prepared by depositing alternately Ti and C thin layers from dual magnetron sputtering sources on aluminoborosilicate glass substrates. Composition, structure, hardness and other mechanical properties have been studied as a function of C/Ti flux ratio. The apparatus used in the experiment was a dual cathode sputtering machine. By rotating the substrate holder, Ti and C layers were alternately deposited on the substrate. Thickness of Ti and C layer deposited in one revolution were 0.15 nm and 0.07 nm, respectively. The C/Ti ratio of the films was controlled by changing the flux ratio of Ti and C. The XPS results showed that the C content in the films changed from 0 at% to 100 at% continuously. The XRD patterns showed that the film structure changed from α-Ti to fcc-TiC, and then, to amorphous carbon with increasing the C/Ti ratio of the films. The maximum dynamic hardness of about 16 GPa was obtained for the film deposited at a C/Ti flux ratio of 1. High adhesion strength and wear resistance were achieved for films deposited at C/Ti ratio of films over 1.
Journal
-
- Shinku
-
Shinku 42 (3), 384-387, 1999
The Vacuum Society of Japan
- Tweet
Keywords
Details 詳細情報について
-
- CRID
- 1390001204065390720
-
- NII Article ID
- 10002476640
-
- NII Book ID
- AN00119871
-
- ISSN
- 18809413
- 05598516
-
- NDL BIB ID
- 4716457
-
- Text Lang
- ja
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed