減圧熱プラズマ成膜法によるチタン酸鉛PbTiO<SUB>3</SUB>薄膜の合成に及ぼす成膜圧力の影響

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  • Effects of Pressure on PbTiO<SUB>3</SUB> Thin Film Prepared by Low-Pressure Thermal Plasma Deposition
  • 減圧熱プラズマ成膜法によるチタン酸鉛PbTiO3薄膜の合成に及ぼす成膜圧力の影響
  • ゲンアツ ネツ プラズマセイマクホウ ニ ヨル チタンサン ナマリ PbTiO3 ハクマク ノ ゴウセイ ニ オヨボス セイマク アツリョク ノ エイキョウ

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PbTiO3 thin films were prepared by low-pressure thermal plasma deposition method on (100)MgO substrates. The mists of the mixed solution of each metal alkoxides and 2-methoxyethanol were introduced into a plasma flame and deposited onto substrates. The constituent phases, the crystal texture and the surface morphology were drastically changed by the chamber pressure. Over 13332 Pa, single phase PbTiO3 films were obtained. They were grown epitaxially and their surface morphology was composed of rectangular shaped grains. The remnant polarization and coercive field of the film from the hysteresis loop were about 0.104 C·m−2 and 5.12 MV·m−1, respectively.

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