Characterization of Atomically Smooth Al Films by Transmission Electron Microscopy and Atmoimc Force Microscopy
Atomically smooth Al films were prepared by vacuum evaporation on heated mica substrates at 350°C. The films consist of single crystals 270 nm in diameter with (111) faces and the crystals are oriented randomly about the  direction which is perpendicular to the substrate. The roughness of the Al film surfaces is 0.6 nm over 1 × 1 μm areas.
- Chemistry letters
Chemistry letters 1997(8), 709-710, 1997-08
The Chemical Society of Japan