Magnetoresistance of(Co, Fe)_<75>(Al, Si)_<25>-O thin films prepared by oblique incidence deposition in an oxygen atomosphere

• WATABE T.

  Dept. of Appl. Phys. Tohoku Univ.

• KUBOTA H.

  Dept. of Appl. Phys. Tohoku Univ.

• MIYAZAKI T.

  Dept. of Appl. Phys. Tohoku Univ.

Bibliographic Information

Other Title

• 斜め蒸着(Co, Fe)_<75>(Al, Si)_<25>-O薄膜の磁気抵抗効果

Journal

• 日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan

  日本応用磁気学会学術講演概要集 = Digest of ... annual conference on magnetics in Japan 20 62-, 1996-09-01

Details

• CRID: 1572543023955928192
• NII Article ID: 10002728918
• NII Book ID: AN10269644
• Text Lang: ja
• Data Source:
  • CiNii Articles