The formation and the heat-treatment effects of CoFeB electroless-plated on amorphous NiSiB alloy ribbon substrates

  • MARUYAMA K.
    Tokyo Institute of Technology
  • SATO T.
    Faculty of engineering, Tokyo Institute of Technology
  • OHNO I.
    Faculty of engineering, Tokyo Institute of Technology
  • NUMATA H.
    Faculty of engineering, Tokyo Institute of Technology

Bibliographic Information

Other Title
  • NiSiB非晶質薄帯基板を用いた無電解CoFeB膜の形成と熱処理効果

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Details 詳細情報について

  • CRID
    1571417124049201280
  • NII Article ID
    10002729280
  • NII Book ID
    AN10269644
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

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