Improvement in temperature properites of layered thin film MI elements by annealing under magnetic field

  • YAMADERA H.
    Toyota Central Research & Development Laboratories, Inc.
  • MORIKAWA T.
    Toyota Central Research & Development Laboratories, Inc.
  • NISHIBE Y.
    Toyota Central Research & Development Laboratories, Inc.
  • OHTA N.
    Toyota Central Research & Development Laboratories, Inc.
  • NONOMURA Y.
    Toyota Central Research & Development Laboratories, Inc.

Bibliographic Information

Other Title
  • 磁場中熱処理による薄膜MI素子の温度特性改善

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Details 詳細情報について

  • CRID
    1574231873801034880
  • NII Article ID
    10002824281
  • NII Book ID
    AN10269644
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

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