Fluorine Effects on Boron Diffusion of P^+ Gate Devices

Author(s)

Journal

  • IEDM Tech. Dig.

    IEDM Tech. Dig. 447, 1989

Cited by:  1

Codes

  • NII Article ID (NAID)
    10003044459
  • Article Type
    Other
  • Data Source
    CJPref 
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