Application of Imaging Plates to High-Resolution High-Voltage Electron Microscopy

• Cantoni Marco

  National Institute for Research in Inorganic Materials

• Horiuchi Shigeo

  National Institute for Research in Inorganic Materials

書誌事項

タイトル別名

• Application of Imaging Plates to High-R

抄録

HRTEM images of an irradiation-sensitive YBCO crystal were taken by using an IP with a pixel size of 25 μm, in an HVEM operated with an accelerating voltage of 800 kV, under different operating conditions. It is found that, as far as the expected resolution is 0.20 nm, the optimum operating condition of the IPs is what is expected from the viewpoint of DQE and S/N ratio; HRTEM images can be taken with the intensity which is lower by two orders than that necessary for a conventional film, without any irradiation damage. The decay rate of information after the exposure to the electron beam has also been measured and it is found that very immediate processing of the IP right after the exposure should be avoided for measuring HRTEM image intensity quantitatively.

収録刊行物

• Materials Transactions, JIM

  Materials Transactions, JIM 39 (9), 909-913, 1998

  社団法人 日本金属学会

キーワード

• high-resolution transmission electron microscope image
• irradiation-sensitive yttrium-based superconductor
• imaging plate with 25 μm pixel
• high-resolution high-voltage electron microscope
• detective quantum efficiency
• signal to noise ratio
• decay rate

詳細情報

• CRID: 1390001204246221952
• NII論文ID: 130003557081
• NII論文ID: 10003803889
• NII書誌ID: AA10699969
• DOI: 10.2320/matertrans1989.39.909
• ISSN: 2432471X
• ISSN: 09161821
• NDL書誌ID: 4583305
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4583305
• Web Site: https://www.jstage.jst.go.jp/article/matertrans1989/39/9/39_9_909/_pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可