Texture Formation of Ti Films Deposited on (011)[100] Single Crystal of Silicon Steel and Stainless Steel Sheets by Different Ion Plating Methods

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  • Texture Formation of Ti Films Deposited

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Abstract

In order to clarify the difference in the textures of the Ti films made on (011)[100] single crystal of silicon steel and stainless steel sheets, Ti coatings by the hollow cathode discharge (HCD) and electron beam (EB)+radio frequency (RF) methods were made on the surfaces of the polished silicon steel and stainless steel samples. Pole figures of the textures of the Ti and these samples were measured simultaneously using a SSD (solid state detector) auto pole figure apparatus.<BR>A {1010}Ti pole figure of the Ti films deposited on the (011)[100] single crystal of silicon steel by the HCD method showed a dominant {1010}[1210] oriented texture. In contrast, a {1010}Ti pole figure of the Ti films done by the EB+RF method showed a weaker texture than that by the HCD.<BR>On the other hand, {1010}Ti pole figures of the Ti films deposited on the stainless steel sheets by the HCD and EB+RF methods showed no preferred orientation.<BR>In the scanning electron microscope observation, the three-dimensional surface roughness of the Ti films on the (011)[100] single crystal of silicon steel was slightly smoother than that of the stainless steel sheet.<BR>It is considered that, due to the higher ionization by the HCD method than by EB+RF, it was possible for the Ti films to form the dominant {1010}[1210] texture and the smooth surface. Also, it should be noticed that the dominant {1010}[1210] texture of the Ti films was formed peferentially on the surface of the (011)[100] single crystal of silicon steel with a 3.5% between [1210]Ti and [100]Si-steel atomic distances.

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