A Study of Damage Induced in In_<0.52>Al_<0.48>As Surface by Reactive Ion Etching

• JIANG Gwo-Cherng

  Department of Physics and Mathematics, Chinese Air Force Academy

Journal

• Japanese journal of applied physics. Pt. 1, Regular papers & short notes

  Japanese journal of applied physics. Pt. 1, Regular papers & short notes 35 (2), 533-536, 1996-02-01

Keywords

• reactive ion etching
• photoluminescence
• photoreflectance
• Raman
• In_<0.52>Al_<0.48>As
• LO

Details

• CRID: 1572543024130454912
• NII Article ID: 10004349804
• NII Book ID: AA10457675
• ISSN: 00214922
• Text Lang: en
• Data Source:
  • CiNii Articles