Nitrogen Effusion and Self-Diffusion in Ga14 N/Ga15N Isotope Heterostructures.

• Ambacher Oliver

  Walter Schottky Institut, TU–München, Am Coulombwall, D–85748 Garching, Germany

• Freudenberg Frank

  Walter Schottky Institut, TU–München, Am Coulombwall, D–85748 Garching, Germany

• Dimitrov Roman

  Walter Schottky Institut, TU–München, Am Coulombwall, D–85748 Garching, Germany

• Angerer Helmut

  Walter Schottky Institut, TU–München, Am Coulombwall, D–85748 Garching, Germany

• Stutzmann Martin

  Walter Schottky Institut, TU–München, Am Coulombwall, D–85748 Garching, Germany

Bibliographic Information

Other Title

• Nitrogen Effusion and Self-Diffusion in
• Nitrogen Effusion and Self-Diffusion in Ga¹⁴N/Ga¹⁵N Isotope Heterostructures

Abstract

Ga¹⁴N/Ga¹⁵N/Ga¹⁴N isotope heterostructures are used to study nitrogen self-diffusion by secondary-ion mass spectrometry and thermally activated decomposition. After interdiffusion of Ga¹⁴N and Ga¹⁵N layers at temperatures between 770^°C and 970^°C the diffusion profiles are measured. The isotope heterostructures are particularly well suited for self-diffusion studies because the diffusion takes place at the interface inside the GaN crystal, and therefore the analysis is free from perturbations such as surface electric fields, mechanical stress or chemical potential gradients. The temperature dependence of the nitrogen self-diffusion coefficient (D) in hexagonal GaN was determined to be 1600 cm^-2 s^-1 exp [(-4.1± 0.4) eV/k_BT], leading to a self-diffusion entropy S_SD of about 10k_B. The nitrogen flux through an isotope interface is compared with the nitrogen loss from a free GaN surface in vacuum above the decomposition temperature, to obtain information about the diffusion kinetics relevant for epitaxial growth and high temperature device applications.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 37 (5A), 2416-2421, 1998

  The Japan Society of Applied Physics

Keywords

• GaN
• self-diffusion
• isotopic heterostructure

Details

• CRID: 1390282681224539392
• NII Article ID: 210000043062
• NII Article ID: 10004518091
• NII Book ID: AA10457675
• DOI: 10.1143/jjap.37.2416
• ISSN: 13474065
• ISSN: 00214922
• NDL BIB ID: 4493365
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4493365
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.37.2416
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.37.2416/pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed