書誌事項
- タイトル別名
-
- Magnetoresistance of Co-Ag Films Deposited in a Magnetic Field by Magnetron Sputtering.
- ジバ チュウ デ サクセイ シタ Co Ag ハクマク ノ ジキ テイコウ コウカ
この論文をさがす
抄録
The magnetoresistive Co-Ag thin films were deposited on glass substrates in a magnetic field at room temperature by an rf magnetron sputtering system. The magnetoresistive properties of the as-deposited samples was investigated in relation to the intensity of the bias magnetic field applied parallel or perpendicular to the film surface during deposition. Samples deposited in a bias magnetic field showed larger responses in magnetoresistance than that of samples prepared by the conventional sputtering. The magnetoresistive response of the samples deposited in a bias magnetic field increased with increasing intensity of the magnetic field, whereas no saturation of the trend was observed in the range of 9 mT for parallel and 150 mT for perpendicular configurations.
収録刊行物
-
- 真空
-
真空 43 (3), 184-187, 2000
一般社団法人 日本真空学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390282679040360320
-
- NII論文ID
- 10004561487
-
- NII書誌ID
- AN00119871
-
- ISSN
- 18809413
- 05598516
-
- NDL書誌ID
- 5360726
-
- 本文言語コード
- ja
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可