Ｘｅ２エキシマーランプを用いた有機シリコン原料の気相における光分解

• 堀井 (前田) 直宏

  福井工業高等専門学校電子情報工学科

• 沖村 邦雄

  東海大学電子工学科

• 井上 昭浩

  福井工業高等専門学校電子情報工学科

書誌事項

タイトル別名

• Photochemical Dissociation of Organic Silicon Source using Xe2 Excimer Lamp in Gas Phase.
• Xe2 エキシマー ランプ オ モチイタ ユウキ シリコン ゲンリョウ ノ キソウ ニ オケル ヒカリ ブンカイ

抄録

Photochemical dissociation of Tetraethoxysilane (TEOS) used as an organic silicon source in the gas phase was investigated by in-situ mass spectrometry. The vacuum uliraviolet (VUV) sources for inducing photochemical reaction were Xe₂ excimer lamp (172 nm : 7.2 eV) and Hg lamp (185 nm : 6.5 eV). TEOS was dissociated by irradiation of VUV in the gas phase, while releasing alkyl groups such as C_xH_y (x= 1-2, y=2-5). Moreover, almost all Si-O bonds of TEOS were not broken at the energy of Xe₂ excimer light. It has been found that the species produced by photochemical reaction in the gas phase have long lifetime of at least more than 2 minutes. Finally, the film deposited on the MgF₂ window has strong light absorption from visible to ultraviolet region, because the film contains organic compounds.

収録刊行物

• 真空

  真空 43 (3), 288-291, 2000

  一般社団法人 日本真空学会

キーワード

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

詳細情報

• CRID: 1390282679040430720
• NII論文ID: 10004561694
• NII書誌ID: AN00119871
• DOI: 10.3131/jvsj.43.288
• ISSN: 18809413
• ISSN: 05598516
• ISSN: http://id.crossref.org/issn/05598516
• NDL書誌ID: 5361056
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5361056
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可