Measurement of Plasma Density and Ionization Ratio of Sputtered Atom in a Biased Directional Sputtering (BDS) System

• MIZUNO Shigeru

  ANELVA Corporation

• TAGUCHI Shin-ichiro

  ANELVA Corporation

• SATO Hideki

  ANELVA Corporation

• SASAKI Masao

  ANELVA Corporation

• SATO Makoto

  ANELVA Corporation

• NAKAGAWA Yukito

  ANELVA Corporation

Bibliographic Information

Other Title

• Biased Directional Sputtering装置におけるプラズマ特性と金属原子のイオン化率の計測

Journal

• 真空

  真空 43 (3), 449-, 2000-03-20

Details

• CRID: 1570854174269653888
• NII Article ID: 10004562087
• NII Book ID: AN00119871
• ISSN: 05598516
• Text Lang: ja
• Data Source:
  • CiNii Articles