N_2 addition to Ar Discharge Gas in Sputter-Deposition of Polyimid Thin Films
-
- IKEDA Yoshihiro
- AMS R & D C, Kanazawa Institute of Technology
-
- FUKUSHIMA Kazuhiro
- AMS R & D C, Kanazawa Institute of Technology
-
- KIKUCHI Naoto
- AMS R & D C, Kanazawa Institute of Technology
-
- KUSANO Eiji
- AMS R & D C, Kanazawa Institute of Technology
-
- NANTO Hidehito
- AMS R & D C, Kanazawa Institute of Technology
-
- KINBARA Akira
- AMS R & D C, Kanazawa Institute of Technology
Bibliographic Information
- Other Title
-
- ポリイミドフィルムのスパッタリングにおける放電ガスへのN_2の添加効果
Search this article
Journal
-
- 真空
-
真空 43 (3), 453-, 2000-03-20
- Tweet
Details
-
- CRID
- 1573387449060055552
-
- NII Article ID
- 10004562099
-
- NII Book ID
- AN00119871
-
- ISSN
- 05598516
-
- Text Lang
- ja
-
- Data Source
-
- CiNii Articles