Strong Basic Sites Accelerate the Deactivation of Oxide Catalysts Supported on FSM-16 for the Vapor-Phase Beckmann Rearrangement of Cyclohexanone Oxime
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- Daisuke Shouro
- Department of Chemistry and Material Engineering, Faculty of Engineering, Shinshu University4-17-1 Wakasato, Nagano
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- Tsuyoshi Nakajima
- Department of Chemistry and Material Engineering, Faculty of Engineering, Shinshu University4-17-1 Wakasato, Nagano
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- Shozi Mishima
- Department of Chemistry and Material Engineering, Faculty of Engineering, Shinshu University4-17-1 Wakasato, Nagano
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<jats:title>Abstract</jats:title> <jats:p>The acidic and basic properties of FSM-16-supported Al2O3, ZnO or CdO were determined by the temperature-programmed desorption (TPD) of ethylamine. Relationship of the deactivation rate of the catalyst during the vapor-phase Beckmann rearrangement with the acidic and basic properties was studied. It was found that the deactivation was accelerated with an increase in the amount of the strong basic sites.</jats:p>
収録刊行物
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- Chemistry Letters
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Chemistry Letters 28 (12), 1319-1320, 1999-12-01
Oxford University Press (OUP)
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詳細情報 詳細情報について
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- CRID
- 1360565169063046912
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- NII論文ID
- 10004704253
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- NII書誌ID
- AA00603318
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- ISSN
- 13480715
- 03667022
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