Preparation of Barium Titanate Film by Metal-Organic Chemical Vapor Deposition and its Thermodynamic Analysis

• Tohma Tetsuro

  Institute for Materials Research, Tohoku University

• Masumoto Hiroshi

  Institute for Materials Research, Tohoku University

• Hirai Toshio

  Institute for Materials Research, Tohoku University

• Goto Takashi

  Institute for Materials Research, Tohoku University

抄録

BaTiO₃ films were prepared on fused silica substrates by metal-organic chemical vapor deposition (MOCVD). Effect of deposition conditions on the composition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phases of deposits. BaTiO₃ films in a single phase were obtained at 973 K and Ba/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO₃ films increased with decreasing total pressure. BaTiO₃ film in thickness of about 1 \\micron had a relative dielectric constant of 480. The dielectric constant of the BaTiO₃ film showed the maximum value of 530 at 360 K.

収録刊行物

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 42 (4), 702-706, 2001

  公益社団法人 日本金属学会

キーワード

• barium titanate
• metal-organic chemical vapor deposition
• thin film
• dielectric constant
• thermodynamic analysis

詳細情報

• CRID: 1390282679222641792
• NII論文ID: 130004451503
• NII論文ID: 10006548624
• NII書誌ID: AA1151294X
• DOI: 10.2320/matertrans.42.702
• COI: 1:CAS:528:DC%2BD3MXktlKjtr8%3D
• ISSN: 13475320
• ISSN: 13459678
• NDL書誌ID: 5764906
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5764906
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/42/4/42_4_702/_pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
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