XHV System for Surface Analysis Using a New Getter to Reduce Hydrogen.

• WATANABE Katsumi

  UL VAC-PHI, Inc.

• NAKAMURA Shizuo

  UL VAC Japan, Ltd.

• TANAKA Akihiro

  UL VAC-PHI, Inc.

• TAGUCHI Masami

  UL VAC-PHI, Inc.

• OIWA Retsu

  UL VAC-PHI, Inc.

書誌事項

タイトル別名

• XHV System for Surface Analysis Using a

抄録

For almost the past two decades, surface analysis instruments have maintained an UHV environment which is achieved by UHV pumps. Recently, the XHV environment has been required in surface analysis, but an instrument which has many parts in a vacuum is eventually limited in the baking temperature. To achieve an XHV environment in a surface analysis instrument, H₂ is the key component. Thus we tested a nonevaporable getter pump to reduce the amount of H₂ and we have measured the residual mass spectrum in a practical instrument using a low outgassing rate mass spectrometer. We obtained a low range of 10^-9 Pa using the NEG pump and conventional pumps with relatively low baking temperature. The ion source of the sputter-etching gun was mainly the outgassing of H₂ under operating conditions, and hence the pumping speed was not sufficient to maintain the amount of H₂ from the ion gun.

収録刊行物

• 真空

  真空 37 (9), 763-767, 1994

  一般社団法人 日本真空学会

キーワード

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

詳細情報

• CRID: 1390001204065587968
• NII論文ID: 10007964470
• NII書誌ID: AN00119871
• DOI: 10.3131/jvsj.37.763
• ISSN: 18809413
• ISSN: 05598516
• NDL書誌ID: 3903658
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I3903658
• 本文言語コード: en
• データソース種別:
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