シリコン表面熱酸化初期過程の反応速度論  [in Japanese] Reaction Kinetics during Initial Stage of Thermal Oxidation on Si(100) Surface  [in Japanese]

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Author(s)

Journal

  • Journal of the Surface Science Society of Japan

    Journal of the Surface Science Society of Japan 23(2), 95-103, 2002-02-10

    日本表面科学会

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Cited by:  1

Codes

  • NII Article ID (NAID)
    10008008335
  • NII NACSIS-CAT ID (NCID)
    AN00334149
  • Text Lang
    JPN
  • Article Type
    Journal Article
  • ISSN
    03885321
  • NDL Article ID
    6066186
  • NDL Source Classification
    ZM35(科学技術--物理学)
  • NDL Call No.
    Z15-379
  • Data Source
    CJP  CJPref  NDL 
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