リン酸塩系埋没材を用いた純チタン鋳造床 : コーティング法による反応層の改善  [in Japanese] Pure Titanium Denture Base Cast Using Phosphate-Bonded Investment : Improvement of Reactive Layer by Coating Method  [in Japanese]

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Abstract

It was attempted to coat the refractory models by zirconia to improve a reactive layer of the pure titanium denture base cast using phosphate-bonded investment and to compare with a usual investing method.<BR>When the coating refractory models were used, the small residual investment on the casting plate removing from the mold was observed.<BR>The surface hardness of the castings prepared with TAIVEST was hardly different between the two samples. However, the surface hardness of the castings prepared with T-INVEST C & B was slightly greater control samples on the casting surface to a depth of about 30μm, but there was little difference between the samples for the depth.<BR>In the coating samples, the microstructure of the surface of the castings showed almost no evident chill layer. The control samples had a chill layer and a columnar crystal layer extending from the surface toward the interior.<BR>Use of the electron probe microanalyzer (EPMA) to determine distribution of various elements in the superficial layer of casting plates showed the reactive layer contained Si and P in control samples. In coating samples, it showed a small reactive layer contained impure elements though there was a high density of Zr of the surface layer of the castings.<BR>The results are suggested that it is possible to improve a reactive layer of the surface of pure titanium denture base cast using phosphate-bonded investment by coating of the surface of the refractory models.

Journal

  • Nihon Hotetsu Shika Gakkai Zasshi

    Nihon Hotetsu Shika Gakkai Zasshi 43(5), 857-866, 1999-10-10

    Japan Prosthodontic Society

References:  22

Cited by:  11

Codes

  • NII Article ID (NAID)
    10008174544
  • NII NACSIS-CAT ID (NCID)
    AN00197911
  • Text Lang
    JPN
  • Article Type
    Journal Article
  • ISSN
    03895386
  • Data Source
    CJP  CJPref  J-STAGE 
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