金属インプリント法による多結晶シリコンの核発生制御  [in Japanese] Metal imprinting for grain positioning of Si films and its application to thin film transistors  [in Japanese]

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Author(s)

    • 浅野 種正 ASANO Tanemasa
    • 九州工業大学マイクロ化総合技術センター Center for Microelectronic Systems, Kyushu Institute of Technology
    • 牧平 憲治 MAKIHIRA Kenji
    • 九州工業大学マイクロ化総合技術センター Center for Microelectronic Systems, Kyushu Institute of Technology

Journal

  • 應用物理

    應用物理 71(5), 557-561, 2002-05-10

    応用物理学会

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Codes

  • NII Article ID (NAID)
    10008201032
  • NII NACSIS-CAT ID (NCID)
    AN00026679
  • Text Lang
    JPN
  • Article Type
    REV
  • ISSN
    03698009
  • NDL Article ID
    6127847
  • NDL Source Classification
    ZM17(科学技術--科学技術一般--力学・応用力学)
  • NDL Call No.
    Z15-243
  • Data Source
    CJP  NDL 
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