触媒化学気相成長法による1mサイズ基板上への均一堆積技術開発  [in Japanese] Development of Large-Area Uniform Deposition Technique on 1-m-Size Substrate by Catalytic Chemical Vapor Deposition  [in Japanese]

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Author(s)

    • 柄澤 稔 KARASAWA Minoru
    • 北陸先端科学技術大学院大学材料科学研究科 School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
    • 坂井 全弘 SAKAI Masahiro
    • 北陸先端科学技術大学院大学材料科学研究科 School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
    • 増田 淳 MASUDA Atsushi
    • 北陸先端科学技術大学院大学材料科学研究科 School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)
    • 松村 英樹 MATSUMURA Hideki
    • 北陸先端科学技術大学院大学材料科学研究科 School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST)

Abstract

Large-area deposition with 1-m size is demonstrated by catalytic chemical vapor deposition (Cat-CVD) apparatus equipped with newly developed showerhead catalyzers. The arrangement of catalyzer wires is determined by simulation based on the experimental results that decomposed species on catalyzers are transported by isotropic thermal diffusion without an influence of the gas flow. Uniformity of± 7.5% and deposition rate of 5.3 Å/s for amorphous silicon films are obtained using silane flow rate of only 100 sccm on the glass substrate with a size of 960 mm ×400 mm. These results suggest that the Cat-CVD is one of the most promising methods for fabrication of large-area devices such as thin-film transistors and solar cells.

Journal

  • Shinku

    Shinku 45(3), 123-126, 2002-03-20

    The Vacuum Society of Japan

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Codes

  • NII Article ID (NAID)
    10008202767
  • NII NACSIS-CAT ID (NCID)
    AN00119871
  • Text Lang
    JPN
  • Article Type
    SHO
  • ISSN
    05598516
  • NDL Article ID
    6144084
  • NDL Source Classification
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL Call No.
    Z16-474
  • Data Source
    CJP  NDL  J-STAGE 
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