スパッタ銅膜の表面ラフネス成長の原子間力顕微鏡による観察

• 大川 賢治

  成蹊大学工学部物理情報工学科

• 中野 武雄

  成蹊大学工学部物理情報工学科

• 馬場 茂

  成蹊大学工学部物理情報工学科

書誌事項

タイトル別名

• Evolution of the Scaling of the Surface Roughness Observed on Sputtered Copper Films with Atomic Force Microscope.
• スパッタ ドウ マク ノ ヒョウメン ラフネス セイチョウ ノ ゲンシカンリョク ケンビキョウ ニ ヨル カンサツ

抄録

Scaling analysis of the surface roughness has been performed on copper films prepared by DC magnetron sputter deposition. The deposition was performed at Ar gas pressures of 2 and 10 Pa. Under both pressures, deposition rates were almost the same and were 1.1 nm/s. Self-affine parameters α and β were determined from a series of AFM topographs of films deposited for various periods (30180 min). At 10 Pa, the roughness parameter α was 0.60.7 and the dynamical parameter β was 0.9, while at 2 Pa, where the surface roughness grew more modestly, α was 0.50.7 and β was 0.6. The difference also appeared in the correlation lengthξ. The correlation length became larger as the deposition proceeded at 10 Pa, in accordance with the roughness evolution theory. On the other hand, it stayed almost constant at 2 Pa. The effect of gas pressure on the surface roughness is discussed.

収録刊行物

• 真空

  真空 45 (3), 134-137, 2002

  一般社団法人 日本真空学会

キーワード

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

詳細情報

• CRID: 1390282679041442688
• NII論文ID: 10008202798
• NII書誌ID: AN00119871
• DOI: 10.3131/jvsj.45.134
• ISSN: 18809413
• ISSN: 05598516
• NDL書誌ID: 6144115
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6144115
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可