イオンビームアシスト蒸着法による窒化ニオブ薄膜の配向制御 [in Japanese] Orientation Control of Niobium Nitride Thin Films by Ion Beam Assisted Deposition [in Japanese]
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The orientation of the niboium nitride thin films was controlled by the assisting ion energy and its incident angle to the substrate in ion beam assisted deposition technique. The films were deposited under the different ion incident angle and ion energy, and their orientation was evaluated by x-ray diffraction. The work function was also measured by Kelvin probe. As a result, it was found that the c-axis of the crystallites were grown along the direction perpendicular to the ion incident angle. The tendency was more prominent when the ion energy was increased. However, the difference in the work function among the deposited samples was not large, probably due to the fact that the films were still polycrystaline.
Shinku 45(3), 215-218, 2002-03-20
The Vacuum Society of Japan