高出力パルスレーザーを用いたパルスレーザー堆積法で作製した鉄シリサイド（β‐ＦｅＳｉ２）薄膜

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タイトル別名
  • Iron Disilicide (.BETA.-FeSi2) Thin Films Prepared by Pulsed Laser Deposition Using High Power Pulse Laser.
  • コウシュツリョク パルスレーザー オ モチイタ パルスレーザー タイセキホウ デ サクセイ シタ テツ シリサイド ベータ FeSi2 ハクマク

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抄録

Iron disilicide (β-FeSi2) thin films were deposited on Si (001) substrate by a pulsed laser deposition using an ArF excimer laser of high power. The film compositions were varied by changing the ratio (trace ratio) of the time required to irradiate each side of the split target made of silicon and iron. It was confirmed from Hall effect measurement that the conduction type of the film changed from p type to n type when the trace ratio varied from 3.2 to 4. From XRD spectra of these films, peaks of β-FeSi2 (422) and (800) were identified. It was found from FE-SEM and AFM observations that the β-FeSi2 films with small surface roughness (Ra =7.36 nm) were obtained and there were little droplets on the film surfaces.

収録刊行物

  • 真空

    真空 45 (3), 239-242, 2002

    一般社団法人 日本真空学会

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